Photomask Characterization
The worldwide photomask market is estimated to be $2.90 billion in 2008 and forecasted to reach $2.7 billion in 2011.
Overview
Methodology and Scope
Two methodologies were used in the development of this information. First, major suppliers were interviewed and contacted for the purpose of this analysis. A questionnaire, which summarizes all of the desired information, was developed and sent to all of the suppliers. Of the companies contacted, 4 responded directly to the survey questionnaire.
Table of Contents
* Methodology and Scope
* Background
* Technology Trends
* Beyond 45-nm
* Market Trends
* Market and Market Outlook
* Summary
Appendices
* Photomasks and Reticle questionnaire
* Summary of Merchant Photomask Supplier Websites
* Figure 1 – 2008 Wafer Fabrication Materials Market
* Figure 2 – Consolidation in the Photomask Industry Since 1986
* Figure 3 – Marketshare Tends in the Photomask Industry
* Figure 4 – Wafer Fab Capacity by Feature Size
* Figure 5 – Key Lithography-related Characteristics by Product
* Figure 6 – Photomask Market Forecast (millions of U.S. dollars)
* Table 1 – List of Photomask Suppliers Contacted for the Photomask Characterization
* Table 2 – DRAM M11/2 Pitch (nm) Technology Trend Targets
* Table 3 – 32-nm Lithography Technology Adoption and Timing
* Table 4 – Summary of Photomask Suppliers Strategic Relationships
* Table 5 – Regional Photomask market 2003-2011

